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Author/Affiliation: Hao Mai TriOpen AccessArticle
7 Pages, 4,171 KB 
Applications of TCAD Simulation Software for Fabrication and study of Process Variation Effects on Threshold Voltage in 180nm Floating-Gate Device
Abstract:
In this work, a study of the process variation effects on the threshold voltage of a floating- gate device is proposed. The study demonstrates the sensitivity of the threshold voltage to five geometrical parameters including gate length, gate width, tunneling gate oxide thickness, bottom oxide-nitride-oxide oxide thickness, and nitride spacer thickness. This paper also proposed…
Read More(This article belongs to the SP9 (Special Issue on Multidisciplinary Innovation in Engineering Science & Technology 2020) & Section Electronic Engineering (EEE))